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Neutron depth profiling



Neutron depth profiling (NDP) is a near-surface analysis technique that is commonly used to obtain profiles of concentration as a function of depth for certain technologically important light elements in nearly any substrate. The technique was first proposed by Ziegler et al [1] to determine the concentration profiles of boron impurities in silicon substrates, and later improved by Biersack and coworkers to much of its existing capabilities.



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